Mechanical behaviour of sand stabilised with colloidal silica
نویسندگان
چکیده
منابع مشابه
Chemical Mechanical Polishing by Colloidal Silica Slurry
Chemical Mechanical Polishing is a unique process enabling technology that allows chip makers to readily drive lithographic patterning steps to smaller dimensions, an ages old, “retro” technology related to glass polishing and metallographic finishing, thus enabling optical lithography to work. It represents a situation that is a true paradigm shift from the typical way in which technological a...
متن کاملExperimental study of applying colloidal nano Silica in improving sand-silt mixtures
Passive method is a new procedure in stabilizing loose soils. This methodology is a type of interlocking soil particles structures. In order to optimum improve in this method, it is necessary to achieve proper penetration length and increase the shear strength of parameters. Researches have shown an increased resistance to liquefaction and decreased permeability due to colloidal Nano silica inj...
متن کاملExperimental study of applying colloidal nano Silica in improving sand-silt mixtures
Passive method is a new procedure in stabilizing loose soils. This methodology is a type of interlocking soil particles structures. In order to optimum improve in this method, it is necessary to achieve proper penetration length and increase the shear strength of parameters. Researches have shown an increased resistance to liquefaction and decreased permeability due to colloidal Nano silica inj...
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We present a theory for the phase behaviour of mixtures of charge-stabilised colloidal spheres plus interacting polymer chains in good and theta -solvents within the framework of free-volume theory. We use simple but accurate combination rules for the depletion thickness around a colloidal particle and for the osmotic pressure up to the semi-dilute concentration regime. Hence, we obtain express...
متن کاملChemical mechanical polishing of titanium with colloidal silica containing hydrogen peroxide--mirror polishing and surface properties.
Chemical mechanical polishing (CMP) of cpTi (Ti) was carried out using two types of slurries, acidic and basic colloidal silica containing H2O2 up to 3 wt%, to obtain flat and mirror-polished surfaces without any contaminated and reacted layers. Polishing behavior and surface properties were investigated using AFM, EPMA, and XPS. Weight loss of Ti polished by CMP using the basic slurry was larg...
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ژورنال
عنوان ژورنال: Geotechnical Research
سال: 2017
ISSN: 2052-6156
DOI: 10.1680/jgere.16.00017